| 摘要 |
<p>An exposure apparatus is provided to reduce the vibration by the counter-acting force accompanied by the driving of an optical device in a projection optical system. An exposure apparatus for carrying out exposure of a wafer comprises: a projection optical system(10) including an optical device and a driving unit(11) for moving the optical device and projecting the light emitted from a disc onto the wafer; a support mechanism(2) including a gas spring and supporting the projection optical system through the gas spring; a controlling section(7) for generating signals for driving the driving unit; and an actuator(21) applying a force to the projection optical device according to the driving signals in a direction opposite to the direction of the counter-acting force accompanied by the acting force from the driving unit to the optical device.</p> |
