| 摘要 |
PURPOSE:To transfer the pattern with high precision without moving the location detecting unit by a method wherein the unit detecting the relative location of the photoelectric mask and the specimen and the photoelectric mask itself are separately arranged and after mutually locating them, the light is introduced between said unit and said mask. CONSTITUTION:The photoelectric mask 3 emitting photoelectron into the specified pattern by means of the photo illumination and the location detecting unit 22 are separately arranged in the vacuum room. In the location detecting unit 22, the image of the reflecting light is formed on the light receiving surface of the photoelectric detector 39 through the intermediary of the Fresnel zone plate 37 selectively illuminating the alignment reference point of the photoelectric mask 3 and the specimen 5 by means of the single color with the wave length of lambda1. Then the distance d between the mask and the specimen is selected making f1.lambda1=(f1+d).lambda2 to form the image on the same light receiving surface by the single color light with the wave length of lambda2 to detect the relative locations of the mask and the specimen. After locating them mutually, the light source 7 is introduced between the mask 3 and the location detecting unit 22 to transfer the pattern. Through these procedures, the pattern may be transferred with high precision without the location detecting errors due to the movement of said unit 22. |
