发明名称 Semiconductor device.
摘要 <p>A semiconductor device comprising a semiconductor substrate of the first conductivity type (120), a self substrate bias generator formed in the semiconductor substrate for generating a voltage with the opposite polarity to that of a externally applied voltage and having a capacitive element (112) and a rectifier element (114, 118) and a group of circuit elements supplied with a voltage generated by the self substrate bias generator, characterized in that the semiconductor substrate of the first conductivity type is supplied with a first reference potential (VDD) selected so as to prevent minority carriers from the capacitive element and the rectifier element from entering into the semiconductor substrate; and the circuit element group is formed in a first semiconductor region (122) formed in the semiconductor substrate. </p>
申请公布号 EP0062894(A2) 申请公布日期 1982.10.20
申请号 EP19820102994 申请日期 1982.04.07
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 IIZUKA, TETSUYA;HARA, HISASHI
分类号 H01L27/02;G05F3/20;(IPC1-7):01L27/02;01L27/06 主分类号 H01L27/02
代理机构 代理人
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