| 发明名称 |
CLEANING APPARATUS FOR SEMICONDUCTOR EQUIPMENT |
| 摘要 |
A cleaning apparatus for a semiconductor equipment is provided. The cleaning apparatus comprising a cleaning pad with a plurality of brushes thereon is located on a rotor of the semiconductor equipment to remove residues within the semiconductor equipment by using the brushes against the residues via moving and rotating the rotor and the cleaning apparatus. |
| 申请公布号 |
US2016233115(A1) |
申请公布日期 |
2016.08.11 |
| 申请号 |
US201615134280 |
申请日期 |
2016.04.20 |
| 申请人 |
HERMES-EPITEK CORPORATION |
发明人 |
HUANG Chien-Ping;Huang Tsan-Hua;HAN Tsung-Hsun;WONG Kian-Poh |
| 分类号 |
H01L21/67;B08B1/00;B08B5/00;A46B3/00;B08B9/08;A46B13/00;A46B9/00;B08B1/04;B08B7/00 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A cleaning apparatus for a semiconductor equipment, comprising:
a cleaning pad configured to be located on a movable frame of the semiconductor equipment; and a plurality of brushes on the cleaning pad; wherein the movable frame is configured to hold a susceptor for holding at least one wafer and the cleaning apparatus, the cleaning apparatus is used to remove residues within the semiconductor equipment by using the brushes against the residues via moving and rotating the cleaning apparatus and the movable frame. |
| 地址 |
TAIPEI CITY TW |
