| 摘要 |
PURPOSE:To form an ultrafine pattern with a charged particle beam by sequentially repeatedly emitting the regions to be emitted until sufficiently large dissolving velocity ratio to a developer between the emitter part and non-emitted part of a charged particle sensitive layer is incorporated. CONSTITUTION:A figure is divided into emitting regions of the size of several tens nm to several tens mum, charged particle beam is emitted to the first emitting region 5 of the first set 4 for the time t0 not to produce thermal change of properties with more than two emitting regions as a set isolated at a distance of 4(Dt0)<1/2> between the emitting regions, where Dcm/sec represents thermal diffusion rate obtained by dividing the thermal conductivity of a substrate by the product of a specific heat CJule/g.deg and density rhog/cm, and t0sec represents the continuous emitting time of the respective emitting regions. Therafter, next emitting regions 6, 7 are sequentially continued as designated by an arrow 8, and all the emitting regions in the first set 4 are emitted. While the other emitting regions are thus emitted. The first emitting regions 5 are cooled by the thermal conduction in the substrate, and after the emission of the first set 4 is completed, it is transferred to the second set 11, and similar procedure is continued to the first set 4. |
