RADIATION SENSITIVE RESIST COMPOSITION AND FORMATION OF PATTERN

摘要

PURPOSE:To obtain a resist compsn. having high sensitivity to radiations by incorporating the resulted product of reaction of a radiation decomposition type polymer having a carboxylic acid group and metal acetyl acetonato compd. into said compsn. CONSTITUTION:This compsn. contains the resulted product of reaction obtd. by bringing the radiation decomposition type polymer having the carboxylic acid group and the metal acetyl acetonato compd. into reaction in an org. solvent as a metal-contg. radiation sensitive polymer. The introduction of the metal acetyl acetonato compd. having a large coefft. of absorption to radiations into the compsn. with high sensitivity is thereby permitted by which the absorption efficiency of the radiations is improved and the higher sensitivity is obtd. The sensitivity is additionally improved in the state of having no film thinning at all by using a strong developing soln. of the extent of not decomposing the resulted product of reaction as a developing soln.