| 摘要 |
PURPOSE:To secure the rapid exchange of a disk under vacuum condition by providing a lock chamber with an exchange device, which holds a disk sent from an ion implanting chamber and an exchange disk prepared within the lock chamber simultaneously. CONSTITUTION:A disk 3, to which a number of wafers 4 are fixed so that they can be freely detached, is rotated in a vacuum ion implanting chamber 1 equipped with an ion implanting hole 2 so as to subject the wafers 4 to ion implanting treatment carried out with ion beams introduced into the chamber 1 through the hole 2. A lock chamber 7 is provided with a disk exchange device, which can hold both the disk 3 sent from the chamber 1 and an exchange disk prepared within the lock chamber simultaneously and can be inserted into and withdrawn from the chamber 7 freely. After the above exchange disk is located on a transfer means 10, the disk 3 exhausted through the ion implanting is detached. |
