| 摘要 |
PURPOSE:To continuously obtain quartz glass having a freely controlled hydroxyl group content by reacting a gaseous mixture of a silicon compound with oxygen and hydrogen chloride in a high frequency plasma flame and depositing the resulting molten silicon dioxide on a target. CONSTITUTION:A plasma torch 1 is worked to generate a plasma flame 5. A silicon compound is blown into the lower end of the flame 5 from a nozzle 6 feeding gaseous starting material and oxidized, and the resulting silicon dioxide is deposited on a fire resistant substrate 7 as quartz glass 8. At this time, Ar and oxygen for generating plasma are fed to an inlet 2 feeding gases for generating plasma through rotor meters 9, 12, respectively, and the silicon compound as gaseous starting material is fed to the nozzle 6 together with gaseous oxygen passing through a rotor meter 13 and a bubbler 14 as a carrier. Hydrogen chloride enters the reaction system after mixing with the gases for generating plasma through a rotor meter 10 and with the gaseous starting material through a rotor meter 11. |
