| 摘要 |
<p>PURPOSE:To obtain a color filter having excellent performance without removing a resist layer after a colored layer is etched, by using a far ultraviolet photoresist material having the spectral sensitivity at <=300nm for the formation of a resist pattern. CONSTITUTION:A colored layer 2 is formed on the entire surface of a transparent substrate 1 to be made into a color filter, and then a far ultraviolet photoresist layer 3 having the spectral sensitivity at <=300nm is coated on the layer 2. A resist pattern 4 is formed by bringing a prescribed pattern mask into contact with the layer 3 and then an exposing process. Then the layer 2 is dry- etched with the pattern 4 used as a mask to obtain a color filter element 5. In such a way of processing, the spectral performance has no change before and after the formation of the pattern with no elimination required for the pattern 4. Accordingly, the element 5 receives no swelling, no exfoliation and no other damages unlike the case when the pattern 4 is removed. Thus an excellent color filter is obtained.</p> |
