| 摘要 |
<p>The present invention relates to a photosensitive material for use in electrophotography comprising a photoconductive layer on which there is a transparent protective layer consisting essentially of a substance resulting from partial hydrolysis of a mixture of (a) a compound having the following general formula I, (b) a copolymer of a compound having the general formula II with a compound having the general formula III or maleic anhydride and (c) a compound having the general formula IV, (1) General formula I (R1)lSi(OR2)m [wherein R1 is a C1-4 alkyl radical, vinyl radical, gamma -methacryloxypropyl radical, phenyl radical, gamma -glycidoxypropyl radical, gamma -chloropropyl radical, gamma -mercaptopropyl radical, gamma - beta (aminoethyl) gamma -aminopropyl radical or gamma -aminopropyl radical; R2 is a hydroxyethylalkyl ether radical or C1-4 alkyl radical; l is 0-2; and m is 2-4.] (2) General formula II <IMAGE> [wherein R3 is hydrogen or a methyl radical; R4 is hydrogen or a C1-4 alkyl radical; n is 1-4; and q is 1-3.] (3) General formula III <IMAGE> [wherein R5 is hydrogen or a methyl radical; R6 is -COOR7 (R7 is hydrogen or a C1-12 alkyl radical, hydroxyalkyl radical, glycidyl radical or dimethylaminoalkyl radical), -CN, -OCOCH3, -CONH2, <IMAGE> +TR <IMAGE> (4) General formula IV <IMAGE> [wherein R8 is a C1-4 alkyl radical or phenyl radical; z is 2-25.</p> |
