发明名称 WATER SOLUBLE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain a composition having sufficient hardness, water resistance and developavility and enabling the elimination of a drying process and an after- exposure process by adding PVA, the condensate of N-methylol-(meth)acrylamide and polyol, and a photopolymn. initiator. CONSTITUTION:Polyvinyl alcohol (A) is blended with the ether type condensate (B) of N-methylolacrylamide or N-methylolmethacrylamide and polyol, and a photopolymn. initiator (C). To the blend may be added a thermal polymn. inhibitor (D) and a photopolymerizing monomer (E) having a vinyl group. The amounts of the components B, C, D, E are 10-120pts.wt., 0.02-10pts.wt. <=2pts.wt. and <=100pts.wt., respectively to 100pts.wt. of the component A. The preferred PVA is obtd. using polyvinyl acetate with 300-2,000 polymn. degree and has 70-90% saponification degree.
申请公布号 JPS57124730(A) 申请公布日期 1982.08.03
申请号 JP19810010607 申请日期 1981.01.27
申请人 TOUKIYOU OUKA KOGYO KK 发明人 AOYAMA TOSHIMI;KATOU BONPEI;TAKANASHI HIROSHI;TOUDA HIROYUKI;NAKANE HISASHI;SUZUKI HIROYUKI
分类号 C08F20/00;C08F20/52;C08F261/00;C08F290/00;C08F299/00;G03F7/032;G03F7/033 主分类号 C08F20/00
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