| 摘要 |
PURPOSE:To enhance the accuracy of automatic registering by repeatedly exposing an internal on a smaller scale while covering a key pattern for automatic registering with an aperture in case of a part not requiring the key pattern so as to make the internal pattern coincide with the key pattern. CONSTITUTION:An original plate on which an internal pattern and a key pattern for automatic registering are at the same reticle is attached to a device for repeating exposure on a smaller scale. The aperture of the device is regulated to a size enabling the exposure of only the internal pattern, and the internal pattern is repeatedly exposed on a smaller scale. When the internal pattern adjacent to the key pattern to be inserted is exposed, the aperture is opened, and the key pattern is exposed together with the internal pattern. In case of only the internal pattern, the aperture is reduced in the width again to cover the key pattern with the aperture, and exposure is conducted. |
