发明名称 SEALING METHOD FOR SEMICONDUCTOR ENCLOSURE
摘要 PURPOSE:To reduce the production ratio of improper hermetical seal for a semiconductor enclosure in a method of hermetically sealing the hollow part of the enclosure by combining a sealing adhesive with the fibrous plastic having high temperature softening property, thereby effectively filling a through hole chain produced due to pressure diference. CONSTITUTION:An external electrode 2 and an element chip 1 are arranged on an insulating substrate 5 made, for example, of beryllia or the like, and a cap 3 made of aluminum is sealed with an adhesive layer 7. This layer 7 is formed by bonding polypropylene non-woven fabric 9 having approx. 40mum of thickness on each of both side surfaces of an epoxy resin adhesive sheet 8 having approx. 300mum of thickness and punching the sheet in the shape of the surface to be bonded. The sealing conditions are pressure heating, bonding and curing at 180-240 deg.C for 20-40min. In this manner, the through hole chain produced at the initial stage of the sealing (at the time of softening the epoxy layer 8) can be effectively filled with molten non-woven fabric softened after the temperature has risen, thereby completely rigidly hermetically sealing the enclosure.
申请公布号 JPS57122546(A) 申请公布日期 1982.07.30
申请号 JP19810007272 申请日期 1981.01.22
申请人 TOKYO SHIBAURA DENKI KK 发明人 NARUSE YOSHITAKA;OGAWA AKIRA;FUKUMA KAZUNORI
分类号 B32B7/12;H01L21/50;H01L23/02;H01L23/10 主分类号 B32B7/12
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