发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY |
摘要 |
<p>NONVOLATILE SEMICONDUCTOR MEMORY An I2L type nonvolatile memory has a structure wherein a floating gate is disposed through an insulating film on the surface of a semiconductor layer in the vicinity of a base region of an NPN transistor in an I2L. The memory controls current to flow through the base region of the NPN transistor of the I2L by means of charges stored in the floating gate. The collector output current of the NPN transistor of the I2L is modulated depending on the presence or absence of a channel beneath the floating gate, being generated depending on the presence or absence of charges within the floating gate and the polarity of the charges. As a result, a variation of the base current appears as an output signal at a collector terminal of the NPN transistor of the I2L, and data stored in the floating gate can be read out.</p> |
申请公布号 |
CA1128660(A) |
申请公布日期 |
1982.07.27 |
申请号 |
CA19790340918 |
申请日期 |
1979.11.29 |
申请人 |
HITACHI LTD. |
发明人 |
WATANABE, TOMOYUKI;KANEKO, KENJI;NAKAMURA, TOHRU;OKADA, YUTAKA;OKABE, TAKAHIRO;NAGATA, MINORU;ITOH, YOKICHI;TOYABE, TORU |
分类号 |
G11C11/411;G11C14/00;G11C16/04;H01L27/02;H01L27/07;H01L27/102;(IPC1-7):11C11/40 |
主分类号 |
G11C11/411 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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