| 摘要 |
PURPOSE:To prevent etching solution from remaining like drops of water and observe the etching condition accurately by a method wherein tge observation windows through which the processing condition is observed are attached aslant to an etching equipment of wafers. CONSTITUTION:The films on wafers 8 transferred into the etching region are etched by etching solution sprayed from nozzles 12. The etching condition is observed through slanted observation windows. As the windows are slanted, even if some of the etching solution sprayed from the nozzles scatters and wets the windows, the solution does not remain on the observation windows and drops downward, so that the processing condition of the wafers can be observed clearly. With this constitution, the processing condition of the films on the wafers can be observed accurately. |
