发明名称 HEATING MECHANISM FOR VACUUM APPARATUS
摘要 PURPOSE:To produce a film of high quality and high homogenity of properties by constituting a sample substrate holder and a heating heater in a vacuum apparatus into one body, and leading the leads of the heaters to the outside by means of a rotator. CONSTITUTION:A heating heater is embedded in a substrate holder to neath pattern 31, and the end parts thereof are conducted to the circumferential edge part of the substrate holder, and are further led to the outside by means of a rotary pole 33 and lead terminals 32. Thereby, the uniformity of film thickness is stabilized to about + or -3-5%, and the temp. difference of the substrate holder per se is kept within about + or -1 deg.C by the integration thereof with the heater, thus resulting in considerably improved temp, uniformity of the substrate. Further, the temp. of the heater per se and the temp. of the substrate holder attain roughly the same temp., and therefore the absolute temp. is controlled precisely.
申请公布号 JPS57110665(A) 申请公布日期 1982.07.09
申请号 JP19800186768 申请日期 1980.12.26
申请人 SUWA SEIKOSHA KK 发明人 YAMADA KUNIHARU
分类号 C23C14/50;C23C14/24;C23C14/54;C23C16/46 主分类号 C23C14/50
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