发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain moderate hardness and rubber elasticity by curing by incorporating specified polyvinyl alcohol, a specified polymerizable monomer and a photopolymn. initiator. CONSTITUTION:This photosensitive resin compsn. contains partially saponified polyvinyl alcohol having 70-99mol.% degree of saponification and 200-2,000 degree of polymn., a polymerizable monomer having a compd. represented by formula I and at least two free hydroxyl groups and a photopolymn. initiator. In the formula I, each of R1, R3 and R4 may be the same or different and is H atom or methyl group, R2 is 1-5C alkylene group having hydroxyl group, R5 is 1-5C alkyl group having hydroxyl group, (n) is an integer of 4-23, (m) is 0 or 1 and (p) is an integer of 1-5. When the photosensitive resin compsn. is used, high rubber elasticity is provided to a cured film formed by exposure.
申请公布号 JPS63177130(A) 申请公布日期 1988.07.21
申请号 JP19870008816 申请日期 1987.01.17
申请人 NIPPON PAINT CO LTD 发明人 KAWAGUCHI CHITOSHI;KAWANAMI TOSHITAKA
分类号 C08F2/48;C08F20/10;C08F20/26;C08F20/28;C08F20/52;C08F220/28;C08F220/58;G03F7/027;G03F7/028;G03F7/032;G03F7/033 主分类号 C08F2/48
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