| 摘要 |
<p>A deposition process is described wherein a depositable vapor, typically chromium, from a vapor source is provided in a vacuum in a chamber which also contains a substrate. The vapor, which normally deposits in tension, is permitted to contact the substrate to cause a deposit thereon. The deposit is bombarded with accelerated particles comprising energetic atomic particles from another source so that the internal stress of the deposit is about zero or in compression. This action favorably modifies the deposit, for example, in the case of chromium, an increase in reflectance is obtained. Only relatively few energetic particles are required to bring about desired change.</p> |
