| 摘要 |
PURPOSE:To enable positioning for a substrate with an electron beam scan in only one direction, by providing a means forming a positioning mark from a pair of marking patterns opposite to the scanning direction of electron beam. CONSTITUTION:An outer sides of a pair of marking patterns opposite each other in a minute interval are nonparallel to the scanning direction. A mark is formed so that the width of scanning direction equals at the marking center. A means is provided to detect the center position by the scanning of electron beam. For instance, a positioning mark 4 has a pair of marking patterns 6, 7 arranged in a minute interval 5 opposite each other to the X-direction. The inner sides 8, 9 are set parallel to the Y-direction. The outer sides 10, 11 are inclined and parallel with each other. The widths l6, l7 are made equal at the center position. The center position 12 is obtained by moving electron beam in the Y-direction for the purpose of detection. |
