| 发明名称 |
PROCESS FOR THE PREPARATION OF STRUCTURED PHOTORESIST LAYERS FOR MICRO-ELECTROFORMING BY X-RAYS |
| 摘要 |
1. A process for the production of varnish layers for microgalvanoplastics by means of X-rays, characterized in that the varnish layer is produced on a base which is provided with a metal layer and consists of a material having a coefficient of expansion which is at least approximately equal to that of the varnish layer. |
| 申请公布号 |
EP0034795(A3) |
申请公布日期 |
1982.05.26 |
| 申请号 |
EP19810101126 |
申请日期 |
1981.02.17 |
| 申请人 |
SIEMENS AKTIENGESELLSCHAFT BERLIN UND MUNCHEN |
发明人 |
TISCHER, PETER, DR.RER.NAT.PHYS.;GLASHAUSER, WALTER |
| 分类号 |
C25D1/10;A61K38/00;B01D59/18;C25D1/00;G03F7/11;(IPC1-7):03F7/26;03F7/02;25D1/10;01D59/18 |
主分类号 |
C25D1/10 |
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