TREATING DEVICE FOR MICROWAVE PLASMA

摘要

PURPOSE:To form uniform plasma by fitting a dielectric plate consisting of a dielectric which is large in relative dielectric constant and small in dielectric loss to the inner wall of the terminal part of a waveguide or the terminal part and the inner wall of the part adjacent to the terminal part. CONSTITUTION:Output electric power of a microwave oscillator 1 is led to a reaction vessel 3 made of quartz via a waveguide 2. Specified kind of gas is introduced into the reaction vessel 3 via a gas feed pipe 6 and discharged at constant flow rate through an exhaust pipe 7. Thereby the inside of the reaction vessel 3 is maintained at constant pressure and the introduced gas is made to plasma by means of microwave electric power and etching processing or depositing treatment of a thin film is performed on the surface of a sample 4 placed on a sample base 5. The cross-section of the waveguide 2 is a rectangular shape or a circular shape and its end is housed in the reaction vessel 3 and enlarged into a tapered shape to reduce the reflection of microwave electric power.