Photolacquer structure with photoresist layer - is on deep UV or electron positive resist

摘要

The photolacquer structure is produced by irradiating photoresist on a substrate using actinic radiation. A layer that may be degraded by energetic radiation or by a dry etching process is formed on the substrate and the photoresist layer is formed on top of it. The degradable layer contains compounds that absorb UV and/or visible light. The degradable layer may be an electron positive resist or a deep UV resist and is thicker than the photoresist layer. The advantage lies in avoiding interference whilst at the same time maintaining good resolution factors.