| 摘要 |
PURPOSE:To equalize quantity of oxygen contained in a thin film to contrive to enhance uniformity of magnetic property of the thin film by a method wherein a negative bias voltage in relation to an anode electrode is applied constantly to the conductive thin film during performance of sputtering. CONSTITUTION:A stainless vacuum vessel 11 is connected air-tightly to a cathode 12, a substrate holder 13 respectively through ring type insulators 14, 15. A target 16 is fixed to the cathode, and a glass substrate 17 is fixed to the substrate holder 13 through a conductive terminal 19 or directly. Moreover an electric power source 21 for voltage between anode and cathode is connected as to apply a DC high voltage being piled up with a high-frequency voltage between the cathode 12 making the stainless vessel 11 as the anode. The vessel 11 to constitute the anode is earthed, and a negative bias voltage in relation to the anode votage is applied to the holder 13 by an electric power source 22 for bias. Accordingly quantity of oxygen in the thin film can be equalized easily, and magnetic characteristic can be nearly equalized extending over the large area. |
