| 发明名称 |
MULTI-LAYER VACUUM EVAPORATION DEPOSITION METHOD |
| 摘要 |
The process involves the use of a base and a vaportreating cover joined together and fastened to a turnable base holder. The axis of rotation of the holder is the middle point of the rotary motion. The equipment is used for depositing a multilayered film by evaporation.
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| 申请公布号 |
KR820000815(B1) |
申请公布日期 |
1982.05.11 |
| 申请号 |
KR19780000739 |
申请日期 |
1978.03.18 |
| 申请人 |
HITACHI WORKS CO LTD;HITACHI ELECTRIONIC CO LTD |
发明人 |
MATSUMARU HARUO;TSUTSI KEN;SASANO AKIRA;NAKANO DOSHIO |
| 分类号 |
(IPC1-7):H01L21/88 |
主分类号 |
(IPC1-7):H01L21/88 |
| 代理机构 |
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