发明名称 FINE POWDER OF HIGH-PURITY SILICON CARBIDE WITH HIGH DISPERSIBILITY, ITS PRODUCTION AND COMPOSITE PLATING THERWITH
摘要 PURPOSE:Starting fine powder of silicon carbide, from which impurities are removed by treating with an acid, is dipped in a basic aqueous solution and separated into solid and liquid phases and the pH value, then the acid content are adjusted to produce the titled fine powder of high dispersibility. CONSTITUTION:A fine powder of silicon carbide of more than 5m<2>/g specific surface area, less than 1mu average particle size and 1.1-1.7 average aspect ratio is treated with an acid to elute impurities, then dipped in a basic aqueous solution of 0.01-1N and separated into solid phase and liquid one to produce a high-quality silicon carbide fine powder containing less than 0.3wt% acid of 4.5-8pH. Then, the resultant fine powder of silicon carbide is added to a nickel matrix so as to become 70-250g/l and the substrate is made the anode to effect the composite plating under conditions of 5.0-6.5pH, 50-70 deg.C bath temperature and 10-30A/dm<2> current density.
申请公布号 JPS5771812(A) 申请公布日期 1982.05.04
申请号 JP19800146800 申请日期 1980.10.22
申请人 IBIGAWA DENKI KOGYO KK 发明人 ENOMOTO AKIRA;HARA KAZUHISA;IWATA YOSHIYUKI
分类号 C01B31/36;C25D15/02 主分类号 C01B31/36
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