发明名称 EXPOSURE DEVICE FOR ELECTRON BEAM
摘要 PURPOSE:To automatically and easily perform beam focusing and the removal of astigmatism by a method wherein the conductive currents of an objective lens and an astigmatic correcting coil are set at the best value for beam resolving power. CONSTITUTION:An electron detector 11 detecting reflective electrons obtained by irradiating electron beams at a target 10 being prepared by adhering fine grains 10b having high reflective electron detection rate is provided on a substrate 10a. An objective lens 9 and an astigmatic correction coil 8 measuring beam resolving power based on the detection signal in the detector 11 are provided. The conductive current of the lens 9 is variably controlled to obtain the optimum current value for the beam resolving power and the conductive current of the lens 9 is set at the value thus obtained. Similarly, the optimum current valve for the beam resolving power measured by variably controlling the coil 8 is set at the value thus obtained. In this way, beam focusing and the removal of astigmatism can automatically be performed.
申请公布号 JPS5766637(A) 申请公布日期 1982.04.22
申请号 JP19800143314 申请日期 1980.10.14
申请人 TOKYO SHIBAURA DENKI KK 发明人 NAKASUJI MAMORU;SASAKI SADAO;GOTOU MINEO;YOSHIKAWA RIYOUICHI
分类号 H01J37/153;H01J37/21;H01J37/305;H01L21/027 主分类号 H01J37/153
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