| 摘要 |
PURPOSE:To make photoelectric sensitivity of a supporting ring face small and to adjust the photoelectric sensitivity of photoelectric face exactly to the peak by forming Sb vacuum evaporation membrane on the internal face of a supporting ring which holds the circumference part of a base plate forming a photoelectric face, thicker than the Sb vacuum evaporation membrane on the photoelectric face. CONSTITUTION:Sb, vacuum evaporation is previously conducted up to a specific thickness, only on the inner surface of inner and outer supporting rings 12, 13 which hold and support the circumference part of a base plate 6 forming input fluorescent face 7. Then, the base plate 6 is held between both supporting rings and set into an enclosure 1. Then Sb vacuum evaporation is conducted to the Sb vacuum evaporation membrane of the input fluorescent face 7 and the inner surfaces of both supporting rings in order to form photoelectric face 16 and Sb vacuum evaporation membrane 17. Thus, by making Sb vacuum evaporation membrane on the inner surfaces of both supporting rings 12, 13 thicker than Sb vacuum evaporation membrane formed on a photoelectric face 16, it is possible to make the photoelectric sensitivity of the inner surfaces of both supporting rings 12, 13 very small and to adjust the photoelectric sensivity of photoelectric face 16 exactly to the peak. |
