发明名称 THE CONTACT METHOD OF THIN FILM CIRCUIT
摘要 After resistance layer(10), conductor layers(11) and protection films(12) are attached to the upper of the substance for thin film, the thin film circuit is made and conductor layers, for example Al layers(9), are interposed between substance for thin film(8) and a part of resistance layers. In soldering, the interposed Al layers make the resistance layers(10) very thin and the defect(15) in the conductor layers(11) is made short.
申请公布号 KR820000313(B1) 申请公布日期 1982.03.19
申请号 KR19740001528 申请日期 1974.02.16
申请人 ALPS ELECTRIC CO LTD 发明人 YOSIMI KAMI JO;NIKI SYUJI;KYOTO ABE;HIROYUKI ITO
分类号 H01L23/48;(IPC1-7):H01L23/48 主分类号 H01L23/48
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