PREPARATION OF TRANSPARENT ELECTRICALLY-CONDUCTIVE FILM OF INDIUM OXIDE

摘要

PURPOSE:To obtain a metallized film havng improved heat stability after heat treatment, by specifying a temperature of a base plate of a substrate for vacuum metallizing of indium or indium oxide. CONSTITUTION:In or In oxide is heated and evaporated under vacuum, and deposited on a base plate not heated or heated at <=100 deg.C. The metallized film is heated at >=300 deg.C in atmosphere or in oxidizing atmosphere. A temperature <=100 deg.C is a temperature not to promote oxidation. The prepared transparent electrically- conductive film of In oxide maintains its almost unchanged surface resistance even after repeated heat treatment.