| 摘要 |
PURPOSE:To form an active ion beam which is required for reactive ion etching by housing a thermoelectrons generating filament in its chamber, separating it from a plasma chamber, and forming active gas plasma in the plasma chamber by means of plasma. CONSTITUTION:An ion beam generator consists of a filament chamber 1 and a plasma chambe 2. A filament 11 is mounted in the chamber 1 through an insulator, and an insulation cylinder 13 is arranged in the space around this filament thereby a thermoelectron emission port is opened on its surface foward the filament. The plasma chamber 2 has a magnetic flux coil 21 on its outer wall and a thermoelectrons focussing anode electrode 22 on the inner wall. A coil-shaped electrode 23 with its voltage equal to the filament potential is arranged at the center section of the plasma chamber 2 concentrically with the plasma chamber. Besides, an ion drawing mesh electrode 24 is provided near the ion exit of the chamber 2 and a potential is applied between the electrode and the filament 11 of the chamber 1 by using a negative high voltage power supply 27. |
