发明名称 FORMING METHOD FOR ELECTRODE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To obtain an Au-Si alloy electrode surely without sintering by putting a layer containing Au on an Si chip with intervention of a layer of material satisfactorily adhered to Au and Si. CONSTITUTION:Ti 7 is applied to the back surface of an Si chip 1 for 50-200Angstrom in thickness by evaporation, and thereon is applied Au 8 by evaporation. A gold leaf 4 is applied by thermocompression bonding to a given portion of a package substrate 3 and heated on a heat block 5 at a temperature of about 400 deg.C, and then the chip 1 is put thereon. The Au leaf smelts through Au-Si eutectic reaction and spreads over the back surface of the chip. When the package substrate 3 is removed from the heat block 5, the chip 1 is firmly bonded onto the package substrate 3 by a eutectic layer 9. Said constituion will provide strong bonding even if sintering is omitted.
申请公布号 JPS5728336(A) 申请公布日期 1982.02.16
申请号 JP19800102942 申请日期 1980.07.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 INOUE KEIJI
分类号 H01L21/52;H01L21/58;(IPC1-7):01L21/58 主分类号 H01L21/52
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