| 摘要 |
PURPOSE:To facilitate the mask matching of a photomask having a black background nearly entirely, by providing mask-matching patterns even at positions corresponding to four corners of each pellet. CONSTITUTION:Each pellet correspondence part is denoted as A, and pellet boundaries as S; and the 2nd mask-matching patterns M' are provided at positions which correspond to four corners of each pellet. Therefore, the boundaries of each pellet is easily found at a glance, and the rough adjustment of mask matching is facilitated. Further, since the 2nd mask-matching patterns M' are on the boundaries of the pellet, restrictions on area are less and because of the rough adjustment, they can be sized large enough, so that its size may by nearly 10 times that of a conventional mask-matching pattern for the rough adjustment. Therefore, those photomasks are adjusted easily and roughly in mask matching. |
