发明名称 COATING METHOD OF PHOSPHOR SUBSISTANCE SLURRY
摘要 PURPOSE:To eliminate the residue of phosphor subsistance block, by injecting the pure water onto the inner circumferential wall face at the skirt section of a glass panel, then injecting and collecting the phosphor slurry under the condition where the moist state is maintained. CONSTITUTION:The pure water 40 of room temperature is injected for 10sec. with the pressure of 1.5kg/cm<2> through a spray nozzle 71 onto the inner face of a skirt section 27 of a glass panel 23 where the forming of a light-absorptive graphite film having a phosphor pattern and the drying are completed. Thereafter while maintaining the moist state on the inner face of the skirt section 27, the phosphor slurry is coated and collected. Then the circumferential section of the phosphor slurry film is cleaned and removed in the drying and trimming process. Consequently the phosphor slurry block is never remained at the circumferential section of the slurry film resulting in fine finish.
申请公布号 JPS5719935(A) 申请公布日期 1982.02.02
申请号 JP19800095334 申请日期 1980.07.10
申请人 MITSUBISHI ELECTRIC CORP 发明人 FUJIWARA KOTOJI;MURAHASHI SHIYOUJI
分类号 H01J9/227;H01J9/20 主分类号 H01J9/227
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