发明名称 |
Class of E-beam resists based on conducting organic charge transfer salts |
摘要 |
Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.
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申请公布号 |
US4312935(A) |
申请公布日期 |
1982.01.26 |
申请号 |
US19800213968 |
申请日期 |
1980.12.08 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ENGLER, EDWARD M.;KUPTSIS, JOHN D.;SCHAD, ROBERT G.;TOMKIEWICZ, YAFFA |
分类号 |
G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03C5/04 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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