| 摘要 |
PURPOSE:To accurately match a mask by providing two scales for imparting coordinates data of two directions of a supporting table and a device for measuring the displacement of the pattern images of a photomask and obtaining the correcting amount by processing the input data. CONSTITUTION:Photomasks A, B are placed on a table 10 havig X-axis scale 26 and a y-axis scale 28, pattern images formed by light sources 14, 16 respectively are inputted through a photoelectric microscope 24 via mirrors 18, 20, which microscope thus measures the displacement between the pattern images of the mask A, B to obtain the table coordinates data in X-axis obtained from X-axis scale 26 and the table coordinates data in Y-axis obtained from Y-axis scale 28, the data are processed by a microcomputer to obtain a correcting value, and the masks A, B are positioned in accordance with the correcting value. Thus, the photomasks can be accurately positioned therebetween. |
