| 发明名称 |
Method for making stained glass photomasks from photographic emulsion |
| 摘要 |
Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photographic emulsion on a sheet of glass and migrating silver ions from the emulsion into the surface of the glass under the influence of an electric field and moderately elevated temperatures.
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| 申请公布号 |
US4309495(A) |
申请公布日期 |
1982.01.05 |
| 申请号 |
US19790080875 |
申请日期 |
1979.10.01 |
| 申请人 |
PPG INDUSTRIES, INC. |
发明人 |
ERNSBERGER, FRED M. |
| 分类号 |
G03C1/00;G03C5/40;G03F1/00;G03F1/08;H01L21/027;(IPC1-7):G03C7/00 |
主分类号 |
G03C1/00 |
| 代理机构 |
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代理人 |
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| 地址 |
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