INSPECTION METHOD OF POSITION DEVIATION OF ALIGNMENT MARK

摘要

PURPOSE: To enable quantitatively reading position deviation amount with a position alignment mark by using a simple method. CONSTITUTION: A rectangular alignment mark 12 formed at the center of a reticle 10 and an alignment mark 12 of a frame which is formed so as to surround the alignment mark 12 are integrated in one pattern. Thereby position deviation amount between both patterns is quantitatively inspected from the overlapping state of a first pattern formed on a silicon substrate 4 and the alignment mark 12 on the second reticle 10.