Glow discharge process for coating e.g. with polymer or silicon - uses gas reservoir behind counter electrodes with large open perforated area

摘要

Substrate coating process involves placing substrates (I) near an electrode, placing a counter-electrode (II) at a uniform distance from (I), changing gas (III) chemically by a capacitive glow discharge, passing (III) through holes in (II) and exhausting spent (III). The novel features are that (II) is so strongly perforated that (III) can diffuse through holes in both directions, a (III) reservoir bounded by (II) is provided and (III) is let into and sucked out of this reservoir. The process is specified for the prodn. of a glow polymer film from monomeric gas or an amorphous Si film from silane. It is suitable for coating a large amt. of (I) in series operation and frequent cleaning of deposits from (II) is avoided.