发明名称 METALLIC PHOTOMASK
摘要 <p>PURPOSE:To prevent the exfoliation of a metallic thin film pattern formed on a surface of a glass substrate by implanting ions of an electrically conductive substance to make the surface conductive. CONSTITUTION:Ions of an electrically conductive substance such as antimony are implanted 5 in the whole surface or a necessary part of a glass substrate 1 with a metallic thin film pattern 2 formed. By the ion implantation an electrically conductive layer 3 is formed on a part not covered with the pattern 2, and this layer 3 is combined with the pattern 2 to make the whole surface of the substrate 1 electrically conductive. Accordingly, pattern exfoliating phenomenon due to the influence of concn. of static electricity or the like can be prevented by relieving the concn., and since metallic atoms existing on the boundary between the pattern 2 and the substrate 1 are forced into the substrate 1 by the ion implantation at the part of the pattern 2, a mixed layer 4 of metal and glass is formed to increase the adhesion of the pattern 2 to the substrate 1.</p>
申请公布号 JPS56158335(A) 申请公布日期 1981.12.07
申请号 JP19800064302 申请日期 1980.05.12
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAZAKI TERUHIKO;HOSHIKA HARUYUKI
分类号 G03F1/00;G03F1/08;G03F1/14;H01L21/027 主分类号 G03F1/00
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