发明名称 STATICALLY ATTRACTING APPARATUS
摘要 PURPOSE:To improve the lifetime of a statically attracting apparatus, by using a thin ceramic plate having an extremely high surface strength of sintered alumina for example, for forming the substrate attracting and holding surface of the apparatus which is directly contacted with a wafer to be treated. CONSTITUTION:An elastic insulating film 3 is deposited all over the surface of a base plate 1. First and second film-type electrodes 5A and 5B are adhered on the insulating film 3. A thin plate 6 of ceramics having an extremely high surface strength, of sintered alumina for example, is deposited on the insulating film 3 including the electrodes 5A and 5B, for providing a surface to be contacted with a wafer to be attracted 11. A series voltage is applied between the electrodes 5A and 5B from a series power supply 9. Since the thin plate 6 has a high surface resistance against friction, pressing or the like, the surface for attracting the wafer 11 will not be damaged mechanically. Further, since the insulating film 3 is elastic, any stress caused by thermal expansion between the thin plate 6 and the base plate 1 is absorbed by the elasticity of the insulating film 3. Thus, the lifetime of a statically attracting apparatus can be improved substantially.
申请公布号 JPS63283037(A) 申请公布日期 1988.11.18
申请号 JP19870117706 申请日期 1987.05.14
申请人 FUJITSU LTD 发明人 KISA TOSHIMASA
分类号 H01L21/302;B23Q3/15;H01L21/3065;H01L21/68;H01L21/683 主分类号 H01L21/302
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