发明名称 |
Heat treatment apparatus and cleaning method of the same |
摘要 |
<p>An unnecessary film is removed by cleaning gas flowing in a treatment vessel 8 for depositing a film on an object W to be processed such as a semiconductor wafer. In this case, the cleaning gas is preheated and activated by the gas heating mechanism 52 and the cleaning gas flows in the treatment vessel 8 in this state. By doing this, an unnecessary film in the treatment vessel made of quartz is removed effectively without damaging the treatment vessel. <IMAGE></p> |
申请公布号 |
EP1167568(A1) |
申请公布日期 |
2002.01.02 |
申请号 |
EP20010114658 |
申请日期 |
2001.06.19 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TAKAHASHI, YUTAKA;HITOSHI, KATO;YAMAMOTO, HIROYUKI;ISHITI, KATSUTOSHI;NISHIMURA, KAZUAKI;SPAULL, PHILLIP |
分类号 |
C23C16/44;C23C16/455;(IPC1-7):C23C16/44;H01L21/316 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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