发明名称 METHOD FOR HEATING VACUUM VAPOR DEPOSITION BOAT
摘要 PURPOSE:To prevent the splash during vapor deposition by increasing an amount of a boat current more than that of a general vapor deposition current during a preheating period of the vacuum deposition boat to preliminarily evaporate impurities contained in a vapor deposition substance. CONSTITUTION:While a shutter is closed, a current of the vapor deposition boat is gradually raised to a value about 10-20% higher than that of a general vapor deposition current. After said current value is held for a difinite time, it is lowered to the general current value and, thereafter, the shutter 4 is opened to initiate the vapor deposition.
申请公布号 JPS56150187(A) 申请公布日期 1981.11.20
申请号 JP19800052902 申请日期 1980.04.23
申请人 HITACHI ELECTRONICS 发明人 SHIYOTOU KATSUAKI
分类号 C23C14/26;C23C14/24;H01L21/203;H01L21/285 主分类号 C23C14/26
代理机构 代理人
主权项
地址