发明名称 |
High energy radiation curable resist material and method of using the same |
摘要 |
A resist material curable by irradiation with high energy radiation such as electron beams, X-rays, ion beams, neutron beams, gamma -rays or deep ultraviolet light but substantially non-curable by irradiation with light having a wavelength of about 300 nm or more, the resist material comprising, as a main component, a solvent-soluble polymer containing an ethylenically unsaturated double bond, the polymer being obtained by reacting (a) a polymer having a plurality of oxirane rings therein and (b) a monomer containing (i) at least one ethylenically unsaturated double bond and (ii) one functional group capable of opening the oxirane rings, and then opening the unreacted oxirane rings.
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申请公布号 |
US4299911(A) |
申请公布日期 |
1981.11.10 |
申请号 |
US19780932160 |
申请日期 |
1978.08.09 |
申请人 |
SOMAR MANUFACTURING CO., LTD. |
发明人 |
OCHI, HIDEO;SHIBATA, YUMI;NAGASAWA, KOHTARO |
分类号 |
C08F2/46;C08F8/00;C08G59/14;G03F7/038;H01R43/00;(IPC1-7):B05D3/06;G03C1/71 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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