CLEANING SOLUTION FOR REMOVING POLYMER AND METHOD OF REMOVING POLYMER USING THE SAME

摘要

A cleaning solution for removing a polymer, and a method for removing a polymer by using the cleaning solution are provided to remove the polymer adsorbed on a semiconductor manufacturing apparatus without the damage of parts. A cleaning solution for removing a polymer comprises 5-10 wt% of a fluorinated salt; 5-15 wt% of an acid or its salt; and 75-90 wt% of a glycol aqueous solution. Preferably the glycol is represented by OH-R-OH, wherein R is a C2-C5 alkyl group; the acid is sulfuric acid, hydrofluoric acid or nitric acid; the salt is ammonium nitrate, ammonium sulfate or ammonium hydrofluorate; and the fluorinated salt comprises at least one selected from the group consisting of ammonium fluoride, ammonium tetramethyl fluoride, ammonium tetraethyl fluoride, ammonium tetrapropyl fluoride and ammonium tetrabutyl fluoride.