Light-sensitive layer contg. complex-forming additive - eliminating luminescence during exposure and increasing stability

摘要

A layer resistant to photons and electrons contains (a) a light-sensitive cpd., (b) a film-forming cpd., (c) an organic solvent, and (d) an additive which forms a donor-acceptor complex with these cpds. and their reaction prods.; this complex eliminates the luminescence effect and increases the stability of the layer. The application is partic. in photolithography, and also in micro-electronics, optics, printing and precision techniques such as prodn. of semi-conductors, solid switches, acoustic electronic components, and photomasks, diffraction gratings and high-resolution printing plates. Fluorescence and phosphoresence during exposure are eliminated. Greater resolution is obtd. For 0.5-1 micron layers, the irregularity of the edges of (sub)micron elements in the image is not more than 0.1 microns. The layer is stable for up to 1 year.