Method of manufacturing a device and device manufactured according to the method

摘要

The invention relates to a method of plasma etching a body in which a surface of the body is covered with a photolacquer mask. According to the invention the method is characterized in that the photolacquer mask to be provided exceeds the desired dimensions of the etching pattern to be formed and furthermore that the method is carried out so that the photolacquer mask is etched more rapidly than the body. An etching profile having inclined sides is obtained.