发明名称 EXPOSURE METHOD BY ELECTRON BEAM
摘要 PURPOSE:To conduct high accuracy exposure by a method wherein an optical bodytube is fixed at a fulcrum and softly connected to a sample chamber, the vibration of the bodytube is detected by means of a laser interferometer and added to the quantity of the correction of beams and the vibration of the bodytube is corrected. CONSTITUTION:Electron beams are focussed by means of electromagnetic lenses 32, and are deflected 33 and irradiate a sample 34. A placing base 25 for the sample 34 is moved by means of outdoor motors 35X, 35Y, and the quantity of movement is detected by means of the mirrors 25MX, 25MY of a side surface of an XY base and measured by means of a laser interferometer 16. In this case, the vibration of a bodytube is also detected by means of the mirrors 12MX, 12MY of a lower surface, and the quantity of the variation of the excessive drive of the base 25 is detected at the same time, also. These measuring values and a command 36 are subtracted 37, information is converted 38 when the measuring values are fixed values or lower, and the difference of the locations is converted into the quantity of the deflection of the beams. The values are added 39 to main deflection information, DA-converted 40 and amplified 41, and the beams are deflected 33. According to this constitution, the accuracy of a pattern can be improved.
申请公布号 JPS56126927(A) 申请公布日期 1981.10.05
申请号 JP19800031254 申请日期 1980.03.12
申请人 FUJITSU LTD 发明人 OSADA TOSHIHIKO;YASUDA HIROSHI
分类号 H01J37/305;H01J37/147;H01J37/304;H01L21/027 主分类号 H01J37/305
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