| 摘要 |
PURPOSE:To form a photomask evaluating substrate having a low defective property by a method wherein a transparent conductive film and a gold film are successively vacuum deposited on the glass substrate installed in a sputtering device. CONSTITUTION:An In or an In+Cr is arranged as an evaporating material in a melting pot 1 of boron nitride 1 having a built-in W heater 3, an Au is arranged in the heating boat consisting of W, Mo or Ta, these melting pot and heating boat are installed in a vacuum evaporating device, the melting pot is heated up in the state wherein oxygen of 2X10<-4> Torr is introduced and 200Angstrom of the In is evaporated on the glass substrate. Then, the induction of the oxygen is discontinued, the melting pot 1 is reheated with the oxygen of 2X10<-5> Torr, and after the Cr of 200Angstrom has been evaporated, the Au of 1,000Angstrom is evaporated by heating up the heating boat. Through these procedures, a multilayer film can be evaporated successively while a vacuum state is maintained and a photomask evaluating substrate having few defects can be obtained, because due consideration is given to the quality of the material of the melting pot and the heating boat. |
