发明名称 Method of making a strain buffer for a semiconductor device
摘要 A thermally and electrically conductive strain buffer for a semiconductor device is made by a method that comprises the steps of (a) providing a plurality of straight, equal-length strands of copper, with the strands aligned such that their lengths are substantially parallel and their ends define a pair of opposing surfaces and (b) closing packing the strands together. Then, layers of highly conductive metal are deposited on said opposing surfaces, and the deposited metal layers provide sufficient structural integrity to hold the strands together so that the resulting strain buffer can be manipulated with substantially no break-up thereof and with substantially no loss of individual ones of the strands.
申请公布号 US4290080(A) 申请公布日期 1981.09.15
申请号 US19790077226 申请日期 1979.09.20
申请人 GENERAL ELECTRIC COMPANY 发明人 HYSELL, ROBERT E.;KALKBRENNER, FRANCIS W.
分类号 H01L21/48;H01L23/051;H01L23/492;(IPC1-7):H01L23/34 主分类号 H01L21/48
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