| 摘要 |
PURPOSE:To precisely correct the mask by detecting the reference position of the mask having incorrect region and fixed to an X-Y stage with a pulse signal to move the stage, setting it at the reference position, irradiating laser light rays thereto, and removing the incorrect region. CONSTITUTION:The mask 21 having incorrect region 21a to be corrected for the mask pattern is secured to the X-Y stage 20, the stage is moved, and disposed directly under the objective lens 22. On the other hand, it is observed through an eyepiece lens 32 with the light from a transmission illumination light source 35, and the slit 26 is set at a value adapted for the shape of incorrect region. Then, the pulse signal is irradiated from the signal source 36 to the incorrect region, the reflected pulse is received by a receiver 37, the laser light rays are irradiated from the laser light source 25 in the state that the incorrect region is set at the focal position with respect to the laser light rays of the objective lens with the detected value, and the incorrect region is removed. Thus, the mask pattern can be corrected with high precision. |
